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structural characterization of hard a-ch films as a function of the methane pressure论文.pdf


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structural characterization of hard a-ch films as a function of the methane pressure论文.pdf
文档介绍:
Diamond and Related Materials 11 (2002) 980–984

Structural characterization of hard a-C:H films as a function of the
methane pressure

R.G. Lacerdaa,b, *, V. Stolojanbb , D.C. Cox , S.R.P. Silva b , F.C. Marques a

aInstituto de F?sica´ ‘Gleb Wataghin’, Unicamp, 13083-970, Campinas, SP, Brazil
bSchool of Electronics, Computing and Mathematics, University of Surrey, Guildford GU2 7XH, UK

Abstract

Hard a-C:H films have been deposited at an industrially significant growth rate (;0.7 nmys), with high hardness (;19 GPa)
and relatively low stress (;1.3 GPa). The films were obtained by the decomposition of methane in a r.f. environment at unusually
conditions of high bias (y800 V) and high pressure (;12 Pa). The properties of the films were determined using optical
transmission spectroscopy, electron energy loss spectroscopy (EELS), Raman spectroscopy, nanohardness, and stress measurements.
The structural analysis indicates that the material is composed of approximately 58% sp2 sites, yet maintaining a relatively high
hardness. It is thought that the sp2 sites contribute to the film hardness, together with the remaining sp3 C–C sites. The main
advantage of the films reported is the very high deposition rate coupled with the relatively low stress, which enables the growth
of
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